光刻

Electron - beam lithography with a novel multilevel resist structure defines the pattern.

采用新型的多层抗蚀剂结构的电子束光刻来形成图形。

The paper also emphatically studies some main applications of interferometric lithographic technology.

故本文还着重研究了干涉光刻技术的一些主要应用。

Individual sodium titanate nanowire - based device is fabricated via e - beam lithography techniques.

利用电子束光刻技术制作了基于钛酸钠纳米线的纳米器件。

In this paper a scanning mirror control system is introduced.

本文介绍了同步辐射光刻镜扫描控制系统。

Lithography - The process used to transfer patterns onto wafers.

光刻-从掩膜到圆片转移的过程。